Tris(Cyclopentadienyl)Thulium 三(环戊二烯)铥(III)

CAS 1272-26-0 MFCD01631285

化学结构图

1272-26-0
SMILES: [CH]1[CH][CH][CH][CH]1.[CH]1[CH][CH][CH][CH]1.[CH]1[CH][CH][CH][CH]1.[Tm]

化学属性

Mol. Formula(C5H5)3Tm
Mol. Weight364.21
Melting Point248-249 °C (dec.)(lit.)
TSCANo
Appearance greenish yellow xtls.
Stabilityair sensitive, moisture sensitive

别名和识别编码

Chemical NameTris(Cyclopentadienyl)Thulium
Synonym Thulium, tris(η(5)-2,4-cyclopentadien-1-yl)- Tris(π-cyclopentadienyl)thulium 三(环戊二烯)铥(III) tris(eta5-2,4-cyclopentadien-1-yl)thulium Tris(cyclopentadienyl)thulium TmCp3 tris(η5-2,4-cyclopentadien-1-yl)thulium Thulium tricyclopentadienide; Tricyclopentadienyl thulium
MDL NumberMFCD01631285
PubChem Substance ID79162
CAS Number1272-26-0
EC Number215-052-1
Chemical Name Translation三(环戊二烯)铥(III)
InChIKeyMWWSVGXLSBSLQO-UHFFFAOYSA-N
LabNetwork Molecule IDLN02178694
InChIInChI=1S/3C5H5.Tm/c3*1-2-4-5-3-1;/h3*1-5H;/q3*-1;+3
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分类

  • {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Thulium, Vapor Deposition Precursors, 材料科学
  • {uni_hamburg} no charge; metal-organic; other heterocycle; carbocycle; alicycle; fused rings; 3ring; 4ring; 5ring; 6ring; 1fragment; zwitterion
  • {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Thulium, Vapor Deposition Precursors

相关文献及参考

  • Short: EINECS Title: EINECS (European Inventory of Existing Commercial Chemical Substances) Source: Official Journal of the European Communities Volume: C 146 A (15.06.1990) Page: 1 Year: 1990 Internet Resource: http://ecb.jrc.ec.europa.eu/esis/index.php?PGM=ein Publish_Date: 1990/06/15
  • Short: III/10a Title: Structure Data of Organic Crystals: C ... C 15 Author: Schudt-Weitz, G.; Strell, I. Editor: Hellwege, K.-H.; Hellwege, A.M. Source: Landolt-Börnstein, New Series Volume: III/10a Year: 1985 ISBN: 3-540-07834-7 ISBN: 978-3-540-07834-0 Internet Resource: DOI:10.1007/b19984 RefComment: XXII, 634 pages. Hardcover Abstract: The volume includes an alphabetical index of all substances and a separate "ring index" with all cyclic compounds.

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 远离热源/火花/明火/热的表面。——禁止吸烟。
  • P231+P232
  • P240 Ground/bond container and receiving equipment. 与地面接触/连接集装箱和接受设备。
  • P241 Use explosion-proof electrical/ventilating/lighting/…/equipment. 使用防爆电气/通风/照明/ .../设备。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P370+P378
  • P402+P404
  • P422 Store contents under… 存储目录在…之下。
  • P501 Dispose of contents/container to..… 处理内容物/容器.....
Hazard statements
  • H228 Flammable solid 易燃固体
  • H261 In contact with water releases flammable gas 与水接触时释放可燃气体。
Hazard Codes F
Personal Protective Equipment Eyeshields, full-face particle respirator type N100 (US), Gloves, respirator cartridge type N100 (US), type P1 (EN143) respirator filter, type P3 (EN 143) respirator cartridges
Signal word Danger
Safety Statements
  • S33 Take precautionary measures against static discharges 对静电采取预防措施；
  • S8 Keep container dry 保持容器干燥；
  • S30 Never add water to this product 切勿将水加入该产品中；
  • S7/8 Keep container tightly closed and dry 保存在严格密闭容器中，保持干燥；
  • S43 In case of fire use ... (indicate in the space the precise type of fire-fighting equipment. If water increases the risk add -?Never use water) 着火时使用（指明具体的消防器材种类，如果用水增加危险，注明“禁止用水”
UN Number UN3181
Risk Statements
  • R11 Highly flammable 非常易燃
  • R14/15 Reacts violently with water, liberating extremely flammable gases 遇水剧烈反应，释放出高度可燃气体
  • R14 Reacts violently with water 遇水会猛烈反应
Storage condition Air & Moisture Sensitive
Packing GroupIII

系列性分类

  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Thulium - Catalysis and Inorganic Chemistry
  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Thulium - Catalysis and Inorganic Chemistry
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Thulium - CVD and ALD Precursors by Metal
  1. CVD & ALD Precursors
  1. CVD & ALD Precursors
  2. Thulium
  1. Metallocenes, Derivatives & Cp Precursors
  2. Thulium

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