Epifluorohydrin 环氧氟丙烷

CAS 503-09-3 MFCD00005131

化学结构图

503-09-3
SMILES: FCC1CO1

化学属性

Mol. FormulaC3H5FO
Mol. Weight76.07
Refractive indexn20/D 1.368(lit.)
Boiling Point85-86 °C(lit.)
Density1.067 g/mL at 25 °C(lit.)
Flash Point4 ºC

别名和识别编码

Chemical NameEpifluorohydrin
Synonym FLUOROMETHYLOXIRAN EPIFLUOROHYDRIN 1,2-EPOXY-3-FLUOROPROPANE 3-Fluoropropene 1,2-oxide epifluorohydrine 1-fluoro-2,3-epoxypropane 3-Fluoro-1,2-epoxypropane Epifluorohydrin (Fluoromethyl)oxirane 环氧氟丙烷 3-Fluoropropylene oxide ALPHA-EPIFLUOROHYDRIN 3-Fluoropropene-1,2-oxide Oxirane, (fluoromethyl)- 1,2-epoxy-3-fluoro-propane Epifluorhydrine fluoromethyl-oxirane (fluoromethyl)oxirane Propane, 1,2-epoxy-3-fluoro- 氟代环氧乙烷 EPIFLUOROHYDRIN 97% 1,2-Epoxy-3-fluoropropane 2-(Fluoromethyl)oxirane 1,2-环氧-3-氟丙烷 1,2-Epoxy-3-fluorpropan 1-Fluor-2,3-epoxypropan 1,2-epoxy-3-fluoro-propan Epifluorohydrin98% 1,2-epoxy-3-fluoropropane
CAS Number503-09-3
PubChem Substance ID10418
EC Number207-960-1
MDL NumberMFCD00005131
Chemical Name Translation环氧氟丙烷
Wiswesser Line NotationT3OTJ B1F
Beilstein Registry Number0102460
LabNetwork Molecule IDLN01750486
InChIInChI=1S/C3H5FO/c4-1-3-2-5-3/h3H,1-2H2
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分类

  • {SA} Building Blocks, Chemical Synthesis, Epoxides, Fluorinated Building Blocks, Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers, Heterocyclic Fluorinated Building Blocks, Lithography Monomers, Materials Science, Micro/NanoElectronics, Organic
  • {SNA} Building Blocks,
  • {SNA} Building Blocks, Chemical Synthesis, Epoxides, Fluorinated Building Blocks, Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers, Heterocyclic Fluorinated Building Blocks, Lithography Monomers, Micro/NanoElectronics, Organic Building Blocks, Other Fluorinated Heterocycles, Oxygen Compounds, Self Assembly & Contact Printing, 材料科学
  • Building Blocks,

相关文献及参考

  • Aldrich MSDS 1 , 854:C / Corp MSDS 1 (1), 1518:B / FT-IR 1 (1), 231:C / FT-IR 2 (1), 363:B / FT-NMR 1 (1), 369:A / IR-Spectra (3), 136:A / IR-Spectra (2), 124:E / NMR-Reference 2 (1), 194:B / RegBook 1 (1), 247:H / Sax 6 , 1285 / Sigma FT-IR 1 (2), 539:B / Structure Index 1 , 33:C:8 / Vapor Phase 3 , 304:B
  • Short: II/14a Title: Molecular Constants: Diamagnetic Molecules Author: Demaison, J.; Dubrulle, A.; Hüttner, W.; Tiemann, E. Editor: Hellwege, K.-H.; Hellwege, A.M. Source: Landolt-Börnstein, New Series Volume: II/14a Page: 1-788 Year: 1982 Keyword: organic compounds; molecular constants; spectroscopy; microwave spectroscopy ISBN: 3-540-11365-7 ISBN: 978-3-540-11365-2 Internet Resource: DOI:10.1007/b19966 RefComment: 196 figs., XI
  • Short: II/6 Title: Molecular Constants from Microwave, Molecular Beam, and Electron Spin Resonance Spectroscopy Author: Demaison, J.; Hüttner, W.; Starck, B.; Buck, I.; Tischer, R.; Winnewisser, M. Editor: Hellwege, K.-H.; Hellwege, A.M. Source: Landolt-Börnstein, New Series Volume: II/6 Year: 1974 Keyword: organic compounds; molecular constants; spectroscopy; microwave spectroscopy ISBN: 3-540-05977-6 ISBN: 978-3-540-05977-6 Internet Resource: DOI:10.1007/b19951 RefComment: 153 figs., XIII, 688 pages
  • Short: III/38B Title: Refractive Indices of Organic Liquids Author: Wohlfarth, Ch.; Wohlfarth, B. Editor: Lechner, M.D. Source: Landolt-Börnstein, New Series Volume: III/38B Year: 1996 Keyword: organic compounds; refractive index; liquids ISBN: 3-540-60596-7 ISBN: 978-3-540-60596-6 Internet Resource: DOI:10.1007/b85533 RefComment: VII, 4210 pages, Hardcover Abstract: Volume III/38 Optical Constants provides critically evaluated data on refractive indices of inorganic and organic liquids and their wavelength dependence (dispension). Part A contains the inorganic, organometallic, and organononmetallic liquids, and the binary liquid mixtur

安全信息

GHS Symbol
WGK Germany3
Hazard Codes F,T F;T
Hazard statements
  • H314 Causes severe skin burns and eye damage 导致严重的皮肤灼伤和眼睛损伤
  • H331 Toxic if inhaled 吸入中毒
  • H225 Highly flammable liquid and vapour 高度易燃液体和蒸气
  • H301 Toxic if swallowed 吞食有毒
  • H311 Toxic in contact with skin 皮肤接触中毒
  • H301+H311+H331
Personal Protective Equipment Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
RTECSTZ3325000
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P301+P310
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P305+P351+P338
  • P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 远离热源/火花/明火/热的表面。——禁止吸烟。
  • P310 Immediately call a POISON CENTER or doctor/physician. 立即呼救解毒中心或医生/医师。
  • P304+P340+P310
  • P370+P378
  • P403+P235
Signal word Danger
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时，立即求医（可能时出示标签）；
  • S16 Keep away from sources of ignition - No smoking 远离火源，禁止吸烟；
  • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
  • S33 Take precautionary measures against static discharges 对静电采取预防措施；
  • S38 In case of insufficient ventilation wear suitable respiratory equipment 通风不良时，佩带适当的呼吸器；
Risk Statements
  • R34 Causes burns 会导致灼伤
  • R23/24/25 Toxic by inhalation, in contact with skin and if swallowed 吸入，皮肤接触及吞食都有毒
  • R11 Highly flammable 非常易燃
UN Number 2924 UN 2924 3/PG 2
Packing GroupI
Hazard Class6.1(a)
Storage condition 0-6°C 
TYPE OF TEST            : LD50 - Lethal dose, 50 percent kill
ROUTE OF EXPOSURE       : Intravenous
SPECIES OBSERVED        : Rodent - mouse
DOSE/DURATION           : 178 mg/kg
TOXIC EFFECTS :
   Details of toxic effects not reported other than lethal dose value
REFERENCE :
   CSLNX* U.S. Army Armament Research & Development Command, Chemical Systems
   Laboratory, NIOSH Exchange Chemicals.  (Aberdeen Proving Ground, MD 21010)
   Volume(issue)/page/year: NX#00407

TYPE OF TEST            : Mutation test systems - not otherwise specified
TEST SYSTEM             : Bacteria - Escherichia coli
DOSE/DURATION           : 10 mmol/L
REFERENCE :
   MUREAV Mutation Research.  (Elsevier Science Pub. B.V., POB 211, 1000 AE
   Amsterdam, Netherlands) V.1-    1964-  Volume(issue)/page/year: 231,205,1990

TYPE OF TEST            : Mutation in microorganisms
TEST SYSTEM             : Bacteria - Escherichia coli
DOSE/DURATION           : 20 umol/L
REFERENCE :
   ARTODN Archives of Toxicology.  (Springer-Verlag, Heidelberger Pl. 3, D-1000
   Berlin 33, Fed. Rep. Ger.)  V.32-    1974-  Volume(issue)/page/year:
   46,277,1980

TYPE OF TEST            : Sister chromatid exchange
TEST SYSTEM             : Rodent - hamster Lung
DOSE/DURATION           : 310 umol/L
REFERENCE :
   MUREAV Mutation Research.  (Elsevier Science Pub. B.V., POB 211, 1000 AE
   Amsterdam, Netherlands) V.1-    1964-  Volume(issue)/page/year: 249,55,1991

TYPE OF TEST            : Mutation in microorganisms
TEST SYSTEM             : Bacteria - Salmonella typhimurium
DOSE/DURATION           : 500 ug/plate
REFERENCE :
   MUREAV Mutation Research.  (Elsevier Science Pub. B.V., POB 211, 1000 AE
   Amsterdam, Netherlands) V.1-    1964-  Volume(issue)/page/year: 58,217,1978

TYPE OF TEST            : Mutation in microorganisms
TEST SYSTEM             : Bacteria - Klebsiella pneumoniae
DOSE/DURATION           : 200 umol/L
REFERENCE :
   MUREAV Mutation Research.  (Elsevier Science Pub. B.V., POB 211, 1000 AE
   Amsterdam, Netherlands) V.1-    1964-  Volume(issue)/page/year: 89,269,1981

TYPE OF TEST            : Mutation in microorganisms
TEST SYSTEM             : Bacteria - Salmonella typhimurium
DOSE/DURATION           : 333 ug/plate
REFERENCE :
   EMMUEG Environmental and Molecular Mutagenesis.  (Alan R. Liss, Inc., 41 E.
   11th St., New York, NY 10003)  V.10-    1987-

其他信息

  • Sigma Aldrich:503-09-3(sigmaaldrich)
  • MOL 文件:503-09-3.mol
  • MSDS 信息:Epifluorohydrin(503-09-3).msds
  • Hazard Note:Flammable/Highly Toxic

系列性分类

  1. Chemical Synthesis 化学合成
  2. Building Blocks 合成砌块
  3. Chemicals by Class 化学分类法
  4. Halogenated 卤化物 (氟氯溴碘)
  5. Fluoro 氟化物
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Lithography Monomers - Self Assembly & Contact Printing
  5. Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers - Lithography Monomers
  1. Chemical Synthesis 化学合成
  2. Building Blocks 合成砌块
  3. Organic Building Blocks 有机砌块
  4. Oxygen Compounds 氧化合物
  5. Epoxides - Oxygen Compounds
  1. Chemical Synthesis 化学合成
  2. Building Blocks 合成砌块
  3. Fluorinated Building Blocks 氟化物砌块
  4. Heterocyclic Fluorinated Building Blocks - Fluorinated Building Blocks
  5. Other Fluorinated Heterocycles - Heterocyclic Fluorinated Building Blocks
  6. Epoxides - Other Fluorinated Heterocycles

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