1,3-Diethyl-1,1,3,3-Tetramethyldisilazane 1,3-二乙基-1,1,3,3-四甲基二硅烷胺

CAS 17882-94-9 MFCD00054742

化学结构图

17882-94-9
SMILES: C[Si](C)(C=C)N[Si](C)(C)C=C

化学属性

Mol. FormulaC8H23NSi2
Mol. Weight189.45
Density0.817 g/mL at 25 °C(lit.)
Boiling Point37-39 °C/0.2 mmHg(lit.)

别名和识别编码

Chemical Name1,3-Diethyl-1,1,3,3-Tetramethyldisilazane
MDL NumberMFCD00054742
CAS Number17882-94-9
Synonym 1,3-二乙基-1,1,3,3-四甲基二硅烷胺
Chemical Name Translation1,3-二乙基-1,1,3,3-四甲基二硅烷胺
PubChem Substance ID329759986
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分类

  • {SNA} CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Organometallic Reagents, Organosilicon, Silazanes, Silicon, Vapor Deposition Precursors
  • {SNA} CVD and ALD Precursors by Metal, Chemical Synthesis, Micro/NanoElectronics, Organometallic Reagents,

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P310 Immediately call a POISON CENTER or doctor/physician. 立即呼救解毒中心或医生/医师。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P305+P351+P338
Signal word Danger
Hazard statements
  • H314 Causes severe skin burns and eye damage 导致严重的皮肤灼伤和眼睛损伤
  • H226 Flammable liquid and vapour 易燃液体和蒸气
Hazard Codes C
Personal Protective Equipment Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
  • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时，立即求医（可能时出示标签）；
  • S16 Keep away from sources of ignition - No smoking 远离火源，禁止吸烟；
Risk Statements
  • R10 Flammable 易燃
  • R34 Causes burns 会导致灼伤

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Silicon - CVD and ALD Precursors by Metal

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