5-Norbornene-2-endo,3-exo-dicarboxylic acid (1R,2R,3R,4S)-rel-双环[2.2.1]庚烷-5-烯-2,3-二羧酸

CAS 1200-88-0 MFCD00270325

化学结构图

1200-88-0
SMILES: O=C(O)[C@@H]1[C@@H]2C=C[C@@H](C2)[C@H]1C(=O)O

化学属性

Mol. FormulaC9H10O4
Mol. Weight182.18
Melting Point185-189°C

别名和识别编码

Chemical Name(1R,2R,3R,4S)-Rel-Bicyclo[2.2.1]Hept-5-Ene-2,3-Dicarboxylic Acid
MDL NumberMFCD00270325
CAS Number1200-88-0
Synonym (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {} {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {} {} {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {} {} {} {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {} {} {} {} {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {} {} {} {} {} {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid {} {} {} {} {} {} {} {} {} {} {LY} (1R,2R,3R,4S)-rel-Bicyclo[2.2.1]hept-5-ene-2,3-
PubChem Substance ID12553357
Chemical Name Translation(1R,2R,3R,4S)-rel-双环[2.2.1]庚烷-5-烯-2,3-二羧酸
LabNetwork Molecule IDLN02124916
InChIInChI=1S/C9H10O4/c10-8(11)6-4-1-2-5(3-4)7(6)9(12)13/h1-2,4-7H,3H2,(H,10,11)(H,12,13)/t4-,5+,6-,7-/m1/s1
Canonical SMILESO=C([C@@H]1[C@@](C2)([H])C=C[C@@]2([H])[C@H]1C(O)=O)O
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分类

  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly & Contact Printing, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly & Contact Printing
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly and Lithography, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers,

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P264+P265
  • P271 Use only outdoors or in a well-ventilated area.? 只能在室外或通风良好的地方使用。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P302+P352
  • P304+P340
  • P305+P351+P338
  • P312 Call a POISON CENTER or doctor/physician if you feel unwell. 如果你感觉不适，呼叫解毒中心或医生/医师。
  • P319
  • P321 Specific treatment (see … on this label). 具体治疗（见本标签上的）。
  • P332+P313
  • P332+P317
  • P337+P313
  • P337+P317
  • P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
  • P362+P364
  • P403+P233
  • P405 Store locked up. 上锁保管。
  • P501 Dispose of contents/container to..… 处理内容物/容器.....
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Signal word Warning
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Hazard Codes Xi
Safety Statements
  • S36 Wear suitable protective clothing 穿戴适当的防护服；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
Storage condition 2-8°C {LY} 2-8°C {} {LY} 2-8°C {} {} {LY} 2-8°C {} {} {} {LY} 2-8°C {} {} {} {} {LY} 2-8°C {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {

其他信息

  • Sigma Aldrich:1200-88-0(sigmaaldrich)
  • MOL 文件:1200-88-0.mol

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Lithography Monomers - Self Assembly & Contact Printing
  5. Alicyclic/Etch-Resistant Monomers - Lithography Monomers

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