5-Norbornene-2-Exo,3-Exo-Dimethanol 5-降冰片烯-2-外,3-外-二甲醇

CAS 699-95-6 MFCD00799568

化学结构图

699-95-6
SMILES: OC[C@@H]1[C@@H]2C[C@@H](C=C2)[C@@H]1CO |&1:2,3,5,8|

化学属性

Mol. FormulaC9H14O2
Mol. Weight154.21
Density1.027 g/mL at 25 °C(lit.)
Boiling Point97 °C at 20 mmHg
Refractive indexn20/D 1.523(lit.)
Flash Point113°(235°F)
TSCANo
Melting Point53 °C

别名和识别编码

Chemical Name5-Norbornene-2-Exo,3-Exo-Dimethanol
MDL NumberMFCD00799568
CAS Number699-95-6
PubChem Substance ID24869641
Synonym rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {} {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {} {} {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {} {} {} {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {} {} {} {} {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {} {} {} {} {} {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-diyldimethanol {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} rel-(1R,2R,3S,4S)-Bicyclo[2.2.1]hept-5-ene-2,3-di
Reaxys-RN3196845
Beilstein Registry Number6(4)5531
Chemical Name Translation5-降冰片烯-2-外,3-外-二甲醇
Canonical SMILESOC[C@@H]1[C@@](C2)([H])C=C[C@@]2([H])[C@@H]1CO
信息真实价格透明    资金保障    专业采购外包团队在线服务   
信息真实价格透明    资金保障    专业采购外包团队在线服务   
品牌质保精细包装    现货库存    一流品牌服务   

分类

  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly & Contact Printing, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly & Contact Printing
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly and Lithography, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers,

安全信息

WGK Germany3
Precautionary statements
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P302+P352+P332+P313+P362+P364
  • P332+P313
  • P305+P351+P338+P337+P313
  • P302+P350
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
  • P337+P313
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Signal word Warning
GHS Symbol
Personal Protective Equipment Eyeshields, full-face respirator (US), Gloves, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S36 Wear suitable protective clothing 穿戴适当的防护服；
  • S60 This material and its container must be disposed of as hazardous waste 该物质及其容器必须作为危险废物处置；
  • S37 Wear suitable gloves 戴适当手套；
Hazard Codes Xi
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
Storage condition

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Lithography Monomers - Self Assembly & Contact Printing
  5. Alicyclic/Etch-Resistant Monomers - Lithography Monomers

相关产品推荐