Tri-T-Pentoxysilanol TPS 三叔戊氧基硅烷醇

CAS 17906-35-3 MFCD03427135

化学结构图

17906-35-3
SMILES: CC(C)(CC)O[Si](O)(OC(C)(C)CC)OC(C)(C)CC

化学属性

Mol. Formula(CH3CH2C(CH3)2O)3SiOH
Mol. Weight306.51
Density0.944 g/mL at 25 °C(lit.)
Boiling Point96-99 °C/2-3 mmHg(lit.)
Appearance colorless liq.
Stabilitymoisture sensitive
Danger-Level-
pH-:-
Redox-

别名和识别编码

Chemical NameTri-T-Pentoxysilanol
Synonym TPS 三(叔-五氧代)硅烷醇
MDL NumberMFCD03427135
CAS Number17906-35-3
PubChem Substance ID329761907
Chemical Name Translation三叔戊氧基硅烷醇
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分类

  • {SNA} 14: Silicon, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Organometallic Reagents, Organosilicon, Silanols, Silicon, Vapor Deposition Precursors
  • {SNA} 14: Silicon, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Chemical Synthesis, Micro/NanoElectronics, Organometallic Reagents, Organosilicon, Silanols, Silicon, Vapor Deposition Precursors, 材料科学
  • {SNA} Micro/NanoElectronics, Silanes, Silicon,
  • {SNA} Micro/NanoElectronics,

安全信息

WGK Germany3
Hazard statements
  • H413 Maycauselonglastingharmfuleffectstoaquaticlife 可能对水生生物造成长期持续有害影响。
Personal Protective Equipment Eyeshields, Gloves, half-mask respirator (US), multi-purpose combination respirator cartridge (US) Eyeshields, Gloves
Restrict -

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors Packaged for Deposition Systems - Vapor Deposition Precursors
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Solution Deposition Precursors - Micro/NanoElectronics
  4. Silicon - Solution Deposition Precursors
  5. Silanes 硅烷
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Silicon - CVD and ALD Precursors by Metal
  1. CVD & ALD Precursors
  1. Alkoxide
  2. Silicon
  1. CVD & ALD Precursors
  2. Silicon
  1. Metal Alkoxides for CVD & ALD
  2. Silicon
  1. Silanes & Silanols for CVD & ALD
  2. Silicon

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