2-(Perfluorodecyl)ethyl methacrylate 甲基丙烯酸2-(全氟癸基)乙基酯

CAS 2144-54-9 MFCD00236095

化学结构图

2144-54-9
SMILES: C=C(C)C(=O)OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

化学属性

Mol. FormulaC16H9F21O2
Mol. Weight632.21
Melting Point43-45 °C
Flash Point113 ºC
Boiling Point95 °C at 760 mmHg

别名和识别编码

Chemical Name2-(Perfluorodecyl)ethyl methacrylate
CAS Number2144-54-9
PubChem Substance ID102214
EC Number218-408-4
MDL NumberMFCD00236095
Synonym 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {} {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {} {} {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {} {} {} {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {} {} {} {} {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {} {} {} {} {} {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {} {} {} {} {} {} {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {} {} {} {} {} {} {} {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl methacrylate {} {} {} {} {} {} {} {} {LY} 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-Henicosafluorododecyl meth
Chemical Name Translation甲基丙烯酸2-(全氟癸基)乙基酯
InChIKeyFQHLOOOXLDQLPF-UHFFFAOYSA-N
LabNetwork Molecule IDLN01995855
InChIInChI=1S/C16H9F21O2/c1-5(2)6(38)39-4-3-7(17,18)8(19,20)9(21,22)10(23,24)11(25,26)12(27,28)13(29,30)14(31,32)15(33,34)16(35,36)37/h1,3-4H2,2H3
Canonical SMILESC=C(C)C(=O)OCCC(C(C(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F
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信息真实价格透明    资金保障    专业采购外包团队在线服务   
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分类

  • {SNA} Acrylic Monomers, Building Blocks, C12 to C63, Carbonyl Compounds, Chemical Synthesis, Esters, Fluorinated Acrylics, Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers, Lithography Monomers,
  • {SNA} Acrylic Monomers, Building Blocks, C12 to C63, Carbonyl Compounds, Chemical Synthesis, Esters, Fluorinated Acrylics, Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers, Lithography Monomers, Micro/NanoElectronics, Monomers, Organic Building Blocks, Polymer Science, Self Assembly & Contact Printing, 材料科学
  • Acrylic Monomers,

安全信息

GHS Symbol
WGK Germany3
Hazard Codes Xi Xi,F
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P264+P265
  • P271 Use only outdoors or in a well-ventilated area.? 只能在室外或通风良好的地方使用。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P302+P352
  • P304+P340
  • P305+P351+P338
  • P312 Call a POISON CENTER or doctor/physician if you feel unwell. 如果你感觉不适，呼叫解毒中心或医生/医师。
  • P319
  • P321 Specific treatment (see … on this label). 具体治疗（见本标签上的）。
  • P332+P313
  • P332+P317
  • P337+P313
  • P337+P317
  • P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
  • P362+P364
  • P403+P233
  • P405 Store locked up. 上锁保管。
  • P501 Dispose of contents/container to..… 处理内容物/容器.....
Signal word Warning
Safety Statements
  • S36 Wear suitable protective clothing 穿戴适当的防护服；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
UN Number UN 3077 9/PG 3 3077
Storage condition 2-8°C, stored under nitrogen {LY} 2-8°C, stored under nitrogen Keep Cold {} {LY} 2-8°C, stored under nitrogen {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, stored under nitrogen {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} 2-8°C, sto

其他信息

  • Sigma Aldrich:2144-54-9(sigmaaldrich)
  • Hazard Note:Irritant
  • MOL 文件:2144-54-9.mol

系列性分类

  1. Chemical Synthesis 化学合成
  2. Building Blocks 合成砌块
  3. Organic Building Blocks 有机砌块
  4. Carbonyl Compounds 羰基化合物
  5. Esters - Carbonyl Compounds
  6. C12 to C63 - Esters
  1. Chemical Synthesis 化学合成
  2. Building Blocks 合成砌块
  3. Chemicals by Class 化学分类法
  4. Halogenated 卤化物 (氟氯溴碘)
  5. Fluoro 氟化物
  1. Materials Science 材料科学
  2. Products for Polymer Science Research
  3. Monomers - Polymer Science
  4. Acrylic Monomers - Monomers
  5. Fluorinated Acrylics - Acrylic Monomers

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