Himic anhydride 顺-5-降冰片烯-外-2,3-二羧酸酐

CAS 2746-19-2 MFCD00630580

化学结构图

2746-19-2
SMILES: O=C1OC(=O)[C@H]2[C@@H]1[C@@H]1C=C[C@H]2C1

化学属性

Mol. FormulaC9H8O3
Mol. Weight164.16
Density1.405
Melting Point140-145°C
TSCAYes
Boiling Point331.1°C at 760 mmHg

别名和识别编码

Chemical NameCis-5-Norbornene-Exo-2,3-Dicarboxylic Anhydride
CAS Number2746-19-2
Synonym Himic anhydride {LY} Himic anhydride {} {LY} Himic anhydride {} {} {LY} Himic anhydride {} {} {} {LY} Himic anhydride {} {} {} {} {LY} Himic anhydride {} {} {} {} {} {LY} Himic anhydride {} {} {} {} {} {} {LY} Himic anhydride {} {} {} {} {} {} {} {LY} Himic anhydride {} {} {} {} {} {} {} {} {LY} Himic anhydride {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Himic anhydride {} {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {} {LY} Himic anhydride {} {} {} {} {} {} {} {} {} {} {} {LY} Himic anhydride {} {} {} {} {} {} {} {} {} {} {} {} {LY} (3aR,4R,7S,7aS)-rel-3a,4,7,7a-Tetrahydro-4,7-methanoisobenzofuran-1,3-dione {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} (3aR,4R,7S,7aS)-rel-3a,4,7,7a-Tetrahydro-4,7-methanoisobenzofuran-1,3-dione {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} (3aR,4R,7S,7aS)-rel-3a,4,7,7a-Tetrahydro-4,7-methanoisobenzofuran-1,3-dione {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY}
EC Number220-384-5
Beilstein Registry Number17(5)11,192
MDL NumberMFCD00630580
PubChem Substance ID637794
Chemical Name Translation顺-5-降冰片烯-外-2,3-二羧酸酐
Reaxys-RN83658
LabNetwork Molecule IDLN01739852
InChIInChI=1S/C9H8O3/c10-8-6-4-1-2-5(3-4)7(6)9(11)12-8/h1-2,4-7H,3H2/t4-,5+,6+,7-
Canonical SMILESO=C1[C@@]2([H])[C@](C(O1)=O)([H])[C@H]3C[C@@H]2C=C3
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分类

  • {uni_hamburg} no charge; oxygen heterocycle; carbocycle; alicycle; large ring; fused rings; 5ring; 6ring; 8ring; 9ring; carbo-anhydride; 1fragment
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly & Contact Printing
  • Chiral Reagents
  • Heterocycles
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly and Lithography, 材料科学
  • Miscellaneous Reagents
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Self Assembly & Contact Printing
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers,

相关文献及参考

  • Beilstein:17(5)11,192
  • Short: IV/20B
  • Short: III/10a

安全信息

Signal word Danger
GHS Symbol
WGK Germany3
Safety Statements
  • S22 Do not breathe dust 不要吸入粉尘；
  • S24 Avoid contact with skin 避免皮肤接触；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S37/39 Wear suitable gloves and eye/face protection 穿戴适当的手套和眼睛/面保护；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
  • R41 Risk of serious damage to eyes 有严重损伤眼睛的危险
  • R42/43
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P264+P265
  • P272 Contaminated work clothing should not be allowed out of the workplace. 污染的工作服不得带出工作场所。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P284 Wear respiratory protection.? 佩戴呼吸保护装置。
  • P285 In case of inadequate ventilation wear respiratory protection. 在通风不足的情况下，戴呼吸防护。
  • P302+P352
  • P302+P352+P333+P313+P362+P364
  • P304+P340
  • P304+P340+P342+P311
  • P304+P341
  • P305+P351+P338
  • P305+P354+P338
  • P310 Immediately call a POISON CENTER or doctor/physician. 立即呼救解毒中心或医生/医师。
  • P317
  • P321 Specific treatment (see … on this label). 具体治疗（见本标签上的）。
  • P333+P313
  • P342+P311
  • P342+P316
  • P362+P364
  • P363 Wash contaminated clothing before reuse. 被污染的衣服洗净后方可重新使用。
  • P501 Dispose of contents/container to..… 处理内容物/容器.....
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H317 May cause an allergic skin reaction 可能导致皮肤过敏
  • H318 Causes serious eye damage 严重伤害眼睛
  • H334 May cause allergy or asthma symptoms or breathing difficulties if inhaled 吸入可能导致过敏或哮喘症状或呼吸困难
Hazard Codes Xn
Storage condition -20°C, sealed storage, away from moisture {LY} -20°C, sealed storage, away from moisture 2-8°C {} {LY} -20°C, sealed storage, away from moisture {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {} {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {} {} {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {} {} {} {} {} {} {} {LY} -20°C, sealed storage, away from moisture {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} -20°C, sealed storage, away from moi

系列性分类

  1. Chemical Synthesis 化学合成
  2. Building Blocks 合成砌块
  3. Organic Building Blocks 有机砌块
  4. Carbonyl Compounds 羰基化合物
  5. Carboxylic Acid Anhydrides 羧酸酐
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Lithography Monomers - Self Assembly & Contact Printing
  5. Alicyclic/Etch-Resistant Monomers - Lithography Monomers

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